Thermally activated reaction–diffusion-controlled chemical bulk reactions of gases and solids

Möller, S.; Linsmeier, Ch.; Kreter, A.; Samm, U.

doi:10.1016/j.nme.2014.11.002

Typ	Amount	VAT	Currency	Share	Status	Cost centre
APC	798.02	0.00	EUR	100.00 %	(Zahlung erfolgt)	ZB
Sum	798.02	0.00	EUR
Total	798.02

Journal Article

FZJ-2015-02705

Thermally activated reaction–diffusion-controlled chemical bulk reactions of gases and solids

Möller, S. (Corresponding Author)FZJ* ; Kreter, A.FZJ* ; Linsmeier, C.FZJ* ; Samm, U.FZJ*

2015
Elsevier Amsterdam [u.a.]

Nuclear materials and energy 1, 1-7 (2015) [10.1016/j.nme.2014.11.002]

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Please use a persistent id in citations: http://hdl.handle.net/2128/8516 doi:10.1016/j.nme.2014.11.002

Abstract: The chemical kinetics of the reaction of thin films with reactive gases is investigated. The removal of thin films using thermally activated solid–gas to gas reactions is a method to in-situ control deposition inventory in vacuum and plasma vessels. Significant scatter of experimental deposit removal rates at apparently similar conditions was observed in the past, highlighting the need for understanding the underlying processes. A model based on the presence of reactive gas in the films bulk and chemical kinetics is presented. The model describes the diffusion of reactive gas into the film and its chemical interaction with film constituents in the bulk using a stationary reaction–diffusion equation. This yields the reactive gas concentration and reaction rates. Diffusion and reaction rate limitations are depicted in parameter studies. Comparison with literature data on tokamak co-deposit removal results in good agreement of removal rates as a function of pressure, film thickness and temperature.

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