Poster (After Call) FZJ-2015-05540

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Engineering the ferroelectric and resistivity Properties of Oxide Films via Compressive and Tensile Strain

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2015

International School of Oxide Electronics, CargèseCargèse, France, 12 Oct 2015 - 24 Oct 20152015-10-122015-10-24

Abstract: Strain can strongly modify the electronic characteristics of oxide materials. For instance the phase transition from the ferroelectric to the dielectric state can be shifted by up to 300 K in either directions. As a result, room temperature permittivity can be enhanced significantly, e.g. for SrTiO3 from εRT≈600 to εRT≈25000. Moreover the resulting ferroelectrics are highly anisotropic and show a number of properties that are extremely interesting for various applications. In this work we try to perform a systematic study of the impact of strain on the system BaxSr(1-x)TiO3. Films with different stoichiometric and thickness are epitaxially grown on DyScO3, TbScO3 and GdScO3 substrates. The lattice mismatch between substrate and film leads to different in-plane compressive and tensile strain within -1.5% to 1.5% in these systems. Tensile strain causes an increase of the in-plane ferroelectric dielectric phase transition temperature, while compressive strain decreases the transition temperature. The films show a metal-insulator transition and an extremely large tunability, they represent relaxor-type ferroelectrics and the ferroelectric properties are highly anisotropic. The data are discussed in terms of existing model for relaxor-type ferroelectrics. The potential of these films for sensors (e.g. surface or bulk acoustic wave devices) is examined.


Contributing Institute(s):
  1. Bioelektronik (PGI-8)
  2. JARA-FIT (JARA-FIT)
  3. Halbleiter-Nanoelektronik (PGI-9)
Research Program(s):
  1. 523 - Controlling Configuration-Based Phenomena (POF3-523) (POF3-523)

Appears in the scientific report 2015
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 Record created 2015-09-04, last modified 2021-01-29



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