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Characterization of Lanthanum Lutetium oxide high-k / metal gate stacks for CMOS process integration

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2012

SpLine Users' Meeting
Seminar, Madrid, SpanienMadrid, Spanien, 16 Apr 20122012-04-16


Note: Record converted from VDB: 12.11.2012
Contributing Institute(s):
  1. Halbleiter-Nanoelektronik (PGI-9)
  2. Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology (JARA-FIT)
Research Program(s):
  1. Grundlagen für zukünftige Informationstechnologien (P42)

Appears in the scientific report 2012
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The record appears in these collections:
JARA > JARA > JARA-JARA\-FIT
Document types > Presentations > Poster
Institute Collections > PGI > PGI-9
Workflow collections > Public records
Publications database
 Record created 2012-11-13, last modified 2018-02-10
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