Conference Presentation (Other)

FZJ-2015-07826

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png High-k/metal gate stacks on high Sn content GeSn alloys

Schulte-Braucks, C. (Corresponding author)FZJ* ; Lehndorff, T. ; von den Driesch, N.FZJ* ; Wirths, S.FZJ* ; Mussler, G.FZJ* ; Savenko, A. ; Breuer, U.FZJ* ; Tiedemann, A.FZJ* ; HartmannExtern* ; Ikonic

2015

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Contributing Institute(s):

1. Halbleiter-Nanoelektronik (PGI-9)
2. JARA-FIT (JARA-FIT)
3. Analytik (ZEA-3)

Research Program(s):

1. 521 - Controlling Electron Charge-Based Phenomena (POF3-521) (POF3-521)
2. E2SWITCH - Energy Efficient Tunnel FET Switches and Circuits (619509) (619509)

Appears in the scientific report 2015

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Database coverage:
No Authors Fulltext

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