Hauptseite > Publikationsdatenbank > In situ optical characterization of LaAlO 3 epitaxy on SrTiO 3 (001) |
Journal Article | FZJ-2016-00599 |
; ; ; ;
2015
EDP Science65224
Les-Ulis
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Please use a persistent id in citations: doi:10.1209/0295-5075/109/37006
Abstract: We followed the growth of LaAlO3 (LAO) on TiO2-terminated SrTiO3(001) in situ using a combination of a special monochromatic ellipsometry at photon energy of 1.96 eV and reflection high-energy electron diffraction (RHEED). We find that the phase of the ellipsometric ratio, defined as $\rho\equiv r_{\text{p}}/r_{\text{s}} \equiv \tan\Psi \exp(i\Delta)$ , changes linearly with the LAO film thickness. From the 4th unit cell (uc) up to the 11th unit cell, the slope of change in Δ is different from that for the initial three unit cells and yet there is no abrupt change in Δ when the LAO thickness increases from 3 uc to 4 uc. We explore structural and electronic processes in the LaAlO3-SrTiO3system that may be responsible for such an in situ observed optical response.
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