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@INPROCEEDINGS{Zhang:281086,
author = {Zhang, Hehe and Lee, W. and Xu, Chengcheng and Hardtdegen,
Alexander and Menzel, Stephan and Hwang, C. S. and Waser, R.
and Hoffmann-Eifert, Susanne},
title = {{C}omparison of the {R}esistance {S}witching {B}ehavior of
{E}x-situ and {I}n-situ {STO} {T}hin {F}ilms grown by
{A}tomic {L}ayer {D}eposition},
reportid = {FZJ-2016-00791},
year = {2015},
month = {May},
date = {2015-05-11},
organization = {European Materials Research Society
meeting, Lille (France), 11 May 2015 -
15 May 2015},
cin = {PGI-7},
cid = {I:(DE-Juel1)PGI-7-20110106},
pnm = {521 - Controlling Electron Charge-Based Phenomena
(POF3-521)},
pid = {G:(DE-HGF)POF3-521},
typ = {PUB:(DE-HGF)24},
url = {https://juser.fz-juelich.de/record/281086},
}