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@INPROCEEDINGS{Zhang:281086,
      author       = {Zhang, Hehe and Lee, W. and Xu, Chengcheng and Hardtdegen,
                      Alexander and Menzel, Stephan and Hwang, C. S. and Waser, R.
                      and Hoffmann-Eifert, Susanne},
      title        = {{C}omparison of the {R}esistance {S}witching {B}ehavior of
                      {E}x-situ and {I}n-situ {STO} {T}hin {F}ilms grown by
                      {A}tomic {L}ayer {D}eposition},
      reportid     = {FZJ-2016-00791},
      year         = {2015},
      month         = {May},
      date          = {2015-05-11},
      organization  = {European Materials Research Society
                       meeting, Lille (France), 11 May 2015 -
                       15 May 2015},
      cin          = {PGI-7},
      cid          = {I:(DE-Juel1)PGI-7-20110106},
      pnm          = {521 - Controlling Electron Charge-Based Phenomena
                      (POF3-521)},
      pid          = {G:(DE-HGF)POF3-521},
      typ          = {PUB:(DE-HGF)24},
      url          = {https://juser.fz-juelich.de/record/281086},
}