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Ultrafast metal-semiconductor-metal photodetectors on low-temperature-grown GaN

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2005
American Institute of Physics Melville, NY

Applied physics letters 86, 211110-1 - 211110-3 () [10.1063/1.1938004]

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Abstract: We have fabricated and characterized ultrafast metal-semiconductor- metal photodetectors based on low-temperature-grown (LT) GaN. The photodetector devices exhibit up to 200 kV/cm electric breakdown fields and subpicosecond carrier lifetime. We recorded as short as 1.4-ps-wide electrical transients using 360-nm-wavelength and 100-fs-duration laser pulses, that is corresponding to the carrier lifetime of 720 fs in our LT GaN material. © 2005 American Institute of Physics.

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Note: Record converted from VDB: 12.11.2012

Contributing Institute(s):
  1. Institut für Halbleiterschichten und Bauelemente (ISG-1)
  2. Center of Nanoelectronic Systems for Information Technology (CNI)
Research Program(s):
  1. Materialien, Prozesse und Bauelemente für die Mikro- und Nanoelektronik (I01)

Appears in the scientific report 2005
Notes: This version is available at the following Publisher URL: http://apl.aip.org
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