% IMPORTANT: The following is UTF-8 encoded. This means that in the presence % of non-ASCII characters, it will not work with BibTeX 0.99 or older. % Instead, you should use an up-to-date BibTeX implementation like “bibtex8” or % “biber”. @ARTICLE{Wensorra:53333, author = {Wensorra, J. and Lepsa, M. I. and Indlekofer, K. M. and Förster, A. and Jaschinsky, P. and Voigtländer, B. and Pirug, G. and Lüth, H.}, title = {{O}hmic contacts for {G}a{A}s based nanocolumns}, journal = {Physica status solidi / A}, volume = {203}, issn = {0031-8965}, address = {Weinheim}, publisher = {Wiley-VCH}, reportid = {PreJuSER-53333}, pages = {3559 - 3564}, year = {2006}, note = {Record converted from VDB: 12.11.2012}, abstract = {Nonalloyed ohmic contacts with lateral dimensions in the sub-100 nm range have been processed and characterized. The contacts are suitable for the fabrication of GaAs/AlGaAs nanocolumns designed in a 'top down' approach. They are realized on n-type GaAs using a thin low-temperature grown GaAs cap layer and Ti/Au metallization. For the lateral patterning of the nanoscaled ohmic contacts, electron-beam lithography based on Hydrogen Silsesquioxan (HSQ) negative resist is used, followed by sputtering and plasma etching of the metals. The I-V characteristics show ohmic contact behavior and demonstrate the scaling of the proposed contacts down to 50 nm lateral dimension. The specific contact resistance is situated in the range of 1-2 x 10(-5) Omega cm(2). (c) 2006 WILEY-VCH Verlag GmbH $\&$ Co. KGaA, Weinheim.}, keywords = {J (WoSType)}, cin = {CNI / ISG-1 / ISG-3}, ddc = {530}, cid = {I:(DE-Juel1)VDB381 / I:(DE-Juel1)VDB41 / I:(DE-Juel1)VDB43}, pnm = {Grundlagen für zukünftige Informationstechnologien}, pid = {G:(DE-Juel1)FUEK412}, shelfmark = {Materials Science, Multidisciplinary / Physics, Applied / Physics, Condensed Matter}, typ = {PUB:(DE-HGF)16}, UT = {WOS:000242536100021}, doi = {10.1002/pssa.200622484}, url = {https://juser.fz-juelich.de/record/53333}, }