Journal Article FZJ-2016-02626

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Doped microcrystalline silicon oxide alloys for silicon-based photovoltaics: Optoelectronic properties, chemical composition, and structure studied by advanced characterization techniques

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2016
Wiley-VCH Weinheim

Physica status solidi / A 213(7), 1814 - 1820 () [10.1002/pssa.201533022]

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Abstract: Doped microcrystalline silicon oxide (μc-SiOx:H) alloys attract significant attention as a functional material in photovoltaic devices. By using various advanced characterization methods, we have studied the relationship between optoelectronic properties, chemical composition, and structure of p-type µc-SiOx:H deposited by plasma enhanced chemical vapor deposition (PECVD). For a wide range of compositions with varying oxygen content, we show that the dominant components are Si and a-SiO2, while the fraction of suboxides is minor. The μc-SiOx:H material with sufficient oxygen content (x = 0.35) exhibits an enlarged optical gap E04 > 2.2 eV and sufficiently high dark conductivity >10−6 S cm−1; the crystalline silicon fraction has a filament-like shape (with a typical width of around 10 nm) forming a branch-like structure elongated in the growth direction over several hundreds of nanometers

Classification:

Contributing Institute(s):
  1. Photovoltaik (IEK-5)
Research Program(s):
  1. 121 - Solar cells of the next generation (POF3-121) (POF3-121)

Appears in the scientific report 2016
Database coverage:
Medline ; Current Contents - Physical, Chemical and Earth Sciences ; IF < 5 ; JCR ; NationallizenzNationallizenz ; No Authors Fulltext ; SCOPUS ; Science Citation Index ; Science Citation Index Expanded ; Thomson Reuters Master Journal List ; Web of Science Core Collection
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 Record created 2016-05-24, last modified 2024-07-12


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