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@INBOOK{Luryi:825776,
author = {Stange, D. and Schulte-Braucks, C. and von den Driesch, N.
and Wirths, S. and Mussler, G. and Lenk, S. and Stoica, T.
and Mantl, S. and Grützmacher, D. and Buca, D. and Geiger,
R. and Zabel, T. and Sigg, H. and Hartmann, J. M. and
Ikonic, Z.},
editor = {Luryi, Serge and Xu, Jimmy and Zaslavsky, Alexander},
title = {{H}igh {S}n-{C}ontent {G}e{S}n {L}ight {E}mitters for
{S}ilicon {P}hotonics},
address = {Hoboken, NJ, USA},
publisher = {John Wiley $\&$ Sons, Inc.},
reportid = {FZJ-2017-00081},
pages = {181-195},
year = {2016},
comment = {Future Trends in Microelectronics / Luryi, Serge (Editor) ;
Hoboken, NJ, USA : John Wiley $\&$ Sons, Inc., 2016, ; ISBN:
9781119069119 ; doi:10.1002/9781119069225.ch2-6},
booktitle = {Future Trends in Microelectronics /
Luryi, Serge (Editor) ; Hoboken, NJ,
USA : John Wiley $\&$ Sons, Inc., 2016,
; ISBN: 9781119069119 ;
doi:10.1002/9781119069225.ch2-6},
abstract = {The present chip technology is based on silicon with
increasing number of other materials integrated into
electrical circuits. This chapter presents a systematic
photoluminescence (PL) study of compressively strained,
direct-bandgap GeSn alloys, followed by the analysis of two
different optical source designs. First, a direct bandgap
GeSn light emitting diode (LED) will be characterized via
power-and temperature-dependent electroluminescence (EL)
measurements. Then, lasing will be demonstrated in a
microdisk (MD) resonator under optical pumping. The
integration of direct-bandgap GeSn-based devices as a light
source for on-chip communications offers the possibility to
monolithically integrate the complete photonic circuit
within mainstream silicon technology. The chapter describes
material properties using Ge0.875Sn0.125 epilayers of
various thicknesses. Temperature-dependent integrated PL
intensity is a suitable method to determine whether a
semiconductor has a direct or indirect fundamental bandgap.
In conclusion, the chapter presents growth and optical
characterization of high-quality GeSn alloys with very high
Sn content.},
cin = {PGI-9 / JARA-FIT},
cid = {I:(DE-Juel1)PGI-9-20110106 / $I:(DE-82)080009_20140620$},
pnm = {521 - Controlling Electron Charge-Based Phenomena
(POF3-521)},
pid = {G:(DE-HGF)POF3-521},
typ = {PUB:(DE-HGF)7},
doi = {10.1002/9781119069225.ch2-6},
url = {https://juser.fz-juelich.de/record/825776},
}