% IMPORTANT: The following is UTF-8 encoded. This means that in the presence % of non-ASCII characters, it will not work with BibTeX 0.99 or older. % Instead, you should use an up-to-date BibTeX implementation like “bibtex8” or % “biber”. @INBOOK{Luryi:825776, author = {Stange, D. and Schulte-Braucks, C. and von den Driesch, N. and Wirths, S. and Mussler, G. and Lenk, S. and Stoica, T. and Mantl, S. and Grützmacher, D. and Buca, D. and Geiger, R. and Zabel, T. and Sigg, H. and Hartmann, J. M. and Ikonic, Z.}, editor = {Luryi, Serge and Xu, Jimmy and Zaslavsky, Alexander}, title = {{H}igh {S}n-{C}ontent {G}e{S}n {L}ight {E}mitters for {S}ilicon {P}hotonics}, address = {Hoboken, NJ, USA}, publisher = {John Wiley $\&$ Sons, Inc.}, reportid = {FZJ-2017-00081}, pages = {181-195}, year = {2016}, comment = {Future Trends in Microelectronics / Luryi, Serge (Editor) ; Hoboken, NJ, USA : John Wiley $\&$ Sons, Inc., 2016, ; ISBN: 9781119069119 ; doi:10.1002/9781119069225.ch2-6}, booktitle = {Future Trends in Microelectronics / Luryi, Serge (Editor) ; Hoboken, NJ, USA : John Wiley $\&$ Sons, Inc., 2016, ; ISBN: 9781119069119 ; doi:10.1002/9781119069225.ch2-6}, abstract = {The present chip technology is based on silicon with increasing number of other materials integrated into electrical circuits. This chapter presents a systematic photoluminescence (PL) study of compressively strained, direct-bandgap GeSn alloys, followed by the analysis of two different optical source designs. First, a direct bandgap GeSn light emitting diode (LED) will be characterized via power-and temperature-dependent electroluminescence (EL) measurements. Then, lasing will be demonstrated in a microdisk (MD) resonator under optical pumping. The integration of direct-bandgap GeSn-based devices as a light source for on-chip communications offers the possibility to monolithically integrate the complete photonic circuit within mainstream silicon technology. The chapter describes material properties using Ge0.875Sn0.125 epilayers of various thicknesses. Temperature-dependent integrated PL intensity is a suitable method to determine whether a semiconductor has a direct or indirect fundamental bandgap. In conclusion, the chapter presents growth and optical characterization of high-quality GeSn alloys with very high Sn content.}, cin = {PGI-9 / JARA-FIT}, cid = {I:(DE-Juel1)PGI-9-20110106 / $I:(DE-82)080009_20140620$}, pnm = {521 - Controlling Electron Charge-Based Phenomena (POF3-521)}, pid = {G:(DE-HGF)POF3-521}, typ = {PUB:(DE-HGF)7}, doi = {10.1002/9781119069225.ch2-6}, url = {https://juser.fz-juelich.de/record/825776}, }