Journal Article

FZJ-2017-00222

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png High throughput transfer technique: Save your graphene

Kireev, D.FZJ* ; Sarik, D.FZJ* ; Wu, T. ; Xie, X. ; Wolfrum, B.FZJ* ; Offenhäusser, A. (Corresponding author)FZJ*

2016
Elsevier Science Amsterdam [u.a.]

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Please use a persistent id in citations: doi:10.1016/j.carbon.2016.05.058

Abstract: The development rate of graphene-related research is tremendous. New methods of graphene growth and transfer are reported on a regular basis, trending towards large-scale. Nevertheless, the fabrication of high-yield and low-cost graphene devices is still challenging. In this work, we approach this problem from a technological point of view and propose a new, so-called “high-throughput transfer technique”. The technique allows a semi-automatic transfer of graphene films right at the desired places on a wafer. We demonstrate the applicability of our method by aligning 52 graphene devices on a 4-inch wafer using only 4 cm2 of graphene. The overall yield of this process is over 90%.

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Contributing Institute(s):

1. Bioelektronik (ICS-8)
2. Bioelektronik (PGI-8)

Research Program(s):

1. 552 - Engineering Cell Function (POF3-552) (POF3-552)

Appears in the scientific report 2016

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Database coverage:
; Current Contents - Physical, Chemical and Earth Sciences ; Ebsco Academic Search ; IF >= 5 ; JCR ; No Authors Fulltext ; SCOPUS ; Science Citation Index ; Science Citation Index Expanded ; Thomson Reuters Master Journal List ; Web of Science Core Collection

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