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000840439 1001_ $$0P:(DE-Juel1)145413$$aDuchamp, Martial$$b0$$eCorresponding author
000840439 245__ $$aFine electron biprism on a Si-on-insulator chip for off-axis electron holography
000840439 260__ $$aAmsterdam$$bElsevier Science$$c2018
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000840439 520__ $$aOff-axis electron holography allows both the amplitude and the phase shift of an electron wavefield propagating through a specimen in a transmission electron microscope to be recovered. The technique requires the use of an electron biprism to deflect an object wave and a reference wave to form an interference pattern. Here, we introduce an approach based on semiconductor processing technology to fabricate fine electron biprisms with rectangular cross-sections. By performing electrostatic calculations and preliminary experiments, we demonstrate that such biprisms promise improved performance for electron holography experiments.
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000840439 7001_ $$0P:(DE-HGF)0$$aGirard, Olivier$$b1
000840439 7001_ $$0P:(DE-HGF)0$$aPozzi, Giulio$$b2
000840439 7001_ $$0P:(DE-Juel1)133754$$aSoltner, Helmut$$b3
000840439 7001_ $$0P:(DE-Juel1)161387$$aWinkler, Florian$$b4
000840439 7001_ $$0P:(DE-Juel1)130980$$aSpeen, Rolf$$b5
000840439 7001_ $$0P:(DE-HGF)0$$aCooper, David$$b6
000840439 7001_ $$0P:(DE-Juel1)144121$$aDunin-Borkowski, Rafal$$b7
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