TY  - JOUR
AU  - Greczynski, G.
AU  - Mráz, S.
AU  - Ruess, H.
AU  - Hans, M.
AU  - Lu, J.
AU  - Hultman, L.
AU  - Schneider, J. M.
TI  - Extended metastable Al solubility in cubic VAlN by metal-ion bombardment during pulsed magnetron sputtering: film stress vs subplantation
JO  - Journal of applied physics
VL  - 122
IS  - 2
SN  - 1089-7550
CY  - Melville, NY
PB  - American Inst. of Physics
M1  - FZJ-2018-01310
SP  - 025304 -
PY  - 2017
LB  - PUB:(DE-HGF)16
DO  - DOI:10.1063/1.4991640
UR  - https://juser.fz-juelich.de/record/843758
ER  -