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| Home > External Publications > Vita Publications > Extended metastable Al solubility in cubic VAlN by metal-ion bombardment during pulsed magnetron sputtering: film stress vs subplantation > print |
| 001 | 843758 | ||
| 005 | 20180217113116.0 | ||
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| 100 | 1 | _ | |a Greczynski, G. |0 0000-0002-4898-5115 |b 0 |
| 245 | _ | _ | |a Extended metastable Al solubility in cubic VAlN by metal-ion bombardment during pulsed magnetron sputtering: film stress vs subplantation |
| 260 | _ | _ | |a Melville, NY |c 2017 |b American Inst. of Physics |
| 336 | 7 | _ | |a article |2 DRIVER |
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| 700 | 1 | _ | |a Ruess, H. |0 P:(DE-HGF)0 |b 2 |
| 700 | 1 | _ | |a Hans, M. |0 0000-0002-1814-3101 |b 3 |
| 700 | 1 | _ | |a Lu, J. |0 P:(DE-HGF)0 |b 4 |
| 700 | 1 | _ | |a Hultman, L. |0 0000-0002-2837-3656 |b 5 |
| 700 | 1 | _ | |a Schneider, J. M. |0 P:(DE-HGF)0 |b 6 |
| 773 | _ | _ | |a 10.1063/1.4991640 |g Vol. 122, no. 2, p. 025304 - |0 PERI:(DE-600)1476463-5 |n 2 |p 025304 - |t Journal of applied physics |v 122 |y 2017 |x 1089-7550 |
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