Journal Article

FZJ-2021-04436

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png The role of fluorination during the physicochemical erosion of yttria in fluorine-based etching plasmas

Kindelmann, M. (Corresponding author)FZJ* ; Weber, M. L.FZJ* ; Stamminger, M. ; Buschhaus, R. ; Wessel, E.FZJ* ; Bram, M.FZJ* ; Guillon, O.FZJ*

2022
Elsevier Science Amsterdam [u.a.]

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Please use a persistent id in citations: http://hdl.handle.net/2128/29146  doi:10.1016/j.jeurceramsoc.2021.10.061

Abstract: A physicochemical mechanism acting between the reactive plasma and the material surface controls the erosion of polycrystalline ceramics in fluorine containing etching plasmas. In this study, a Y2O3/YOF composite was exposed to a fluorine etching plasma. Relocalization enables the direct correlation of crystalline orientation with material response. Our study reveals an orientation dependent surface fluorination of Y2O3, which controls the etching resistance and morphology formation. Orientations near the low index planes (001), (010) and (100) exhibit the lowest stability due to a homogeneous surface reaction. The presented results help to extend the mechanistic understanding of the plasma-material interaction of Y2O3.

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Contributing Institute(s):

1. Elektronische Materialien (PGI-7)
2. Materialwissenschaft u. Werkstofftechnik (ER-C-2)
3. Werkstoffsynthese und Herstellungsverfahren (IEF-1)
4. Werkstoffstruktur und -eigenschaften (IEK-2)

Research Program(s):

1. 5233 - Memristive Materials and Devices (POF4-523) (POF4-523)
2. 5353 - Understanding the Structural and Functional Behavior of Solid State Systems (POF4-535) (POF4-535)

Appears in the scientific report 2022

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Database coverage:
; ; ; Clarivate Analytics Master Journal List ; Current Contents - Engineering, Computing and Technology ; Current Contents - Physical, Chemical and Earth Sciences ; Ebsco Academic Search ; Essential Science Indicators ; IF >= 5 ; JCR ; SCOPUS ; Science Citation Index Expanded ; Web of Science Core Collection

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