Contribution to a conference proceedings

FZJ-2024-01005

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Improved performance of FDSOI FETs at cryogenic temperatures by optimizing ion implantation into silicide

Han, Y. (Corresponding author)FZJ* ; Sun, J.FZJ* ; Radu, I. ; Knoch, J. ; Grützmacher, D.FZJ* ; Zhao, Q.-T.FZJ*

2023

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Contributing Institute(s):

1. Halbleiter-Nanoelektronik (PGI-9)

Research Program(s):

1. 5221 - Advanced Solid-State Qubits and Qubit Systems (POF4-522) (POF4-522)
2. DFG project 422581876 - Kryogene CMOS Technologie für die Realisierung von von klassischen QuBit-Kontrollschaltkreisen (422581876) (422581876)

Appears in the scientific report 2023

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