Home > Institute Collections > PGI > PGI-9 > Fabrication Optimization of Suspended Stencil Mask Lithography for Multi-Terminal Josephson Junctions
 
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Fabrication Optimization of Suspended Stencil Mask Lithography for Multi-Terminal Josephson Junctions

 ;  ;  ;  ;

2025

[10.26165/juelich-data/7wrrrh]

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Contributing Institute(s):
  1. Halbleiter-Nanoelektronik (PGI-9)
Research Program(s):
  1. 5222 - Exploratory Qubits (POF4-522) (POF4-522)
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Institute Collections > PGI > PGI-9
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 Record created 2026-01-19, last modified 2026-01-19
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