Journal Article

FZJ-2026-02973

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Unravelling chemical etchant influences during assisted wet-transfer to obtain high quality MoS2 atomic layers

Singh, A. P. ; Xu, H. ; Ghiami, A. ; Tang, S. ; Wang, Z.FZJ* ; Kalisch, H. ; Hoffmann-Eifert, S.FZJ* ; Daus, A. ; Ingebrandt, S. ; Vescan, A. ; Pachauri, V.

2024
Elsevier Amsterdam

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Please use a persistent id in citations: doi:10.1016/j.apsusc.2024.160331  doi:10.34734/FZJ-2026-02973

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Contributing Institute(s):

1. Elektronische Materialien (PGI-7)

Research Program(s):

1. 5233 - Memristive Materials and Devices (POF4-523) (POF4-523)
2. BMBF 16ME0399 - Verbundprojekt: Neuro-inspirierte Technologien der künstlichen Intelligenz für die Elektronik der Zukunft - NEUROTEC II - (BMBF-16ME0399) (BMBF-16ME0399)
3. BMBF 16ME0398K - Verbundprojekt: Neuro-inspirierte Technologien der künstlichen Intelligenz für die Elektronik der Zukunft - NEUROTEC II - (BMBF-16ME0398K) (BMBF-16ME0398K)

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Database coverage:
; ; ; Clarivate Analytics Master Journal List ; Current Contents - Engineering, Computing and Technology ; Current Contents - Physical, Chemical and Earth Sciences ; Ebsco Academic Search ; Essential Science Indicators ; IF >= 5 ; JCR ; Nationallizenz ; SCOPUS ; Science Citation Index Expanded ; Web of Science Core Collection

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