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Conference Presentation (Plenary/Keynote) FZJ-2012-00155
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Marker process for high overlay accuracy e-beam lithography

 ;  ;

2012

DPG-Spring Meeting, BerlinBerlin, Germany, 25 Mar 2012 - 30 Mar 20122012-03-252012-03-30

Contributing Institute(s):
  1. Halbleiter-Nanoelektronik (PGI-9)
  2. Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology (JARA-FIT)
  3. PGI-8-PT (PGI-8-PT)
Research Program(s):
  1. 42G - Peter Grünberg-Centre (PG-C) (POF2-42G41) (POF2-42G41)

Appears in the scientific report 2012
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The record appears in these collections:
Document types > Presentations > Conference Presentations
JARA > JARA > JARA-JARA\-FIT
Institute Collections > PGI > PGI-8-PT
Institute Collections > PGI > PGI-9
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 Record created 2012-11-30, last modified 2021-01-29
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