Conference Presentation (Plenary/Keynote)

FZJ-2012-00155

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Marker process for high overlay accuracy e-beam lithography

Moers, J. (Corresponding author)FZJ* ; Trellenkamp, S. ; Rienks, B.

2012

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Contributing Institute(s):

1. Halbleiter-Nanoelektronik (PGI-9)
2. Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology (JARA-FIT)
3. PGI-8-PT (PGI-8-PT)

Research Program(s):

1. 42G - Peter Grünberg-Centre (PG-C) (POF2-42G41) (POF2-42G41)

Appears in the scientific report 2012

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