Elastic strain and dopant activation in ion implanted strained Si nanowires

Minamisawa, R.A.; Buca, D.; Trellenkamp, S.; Habicht, S.; Mantl, S.; Carius, R.; Bourdelle, K.K.

doi:10.1063/1.3520665

Journal Article

Elastic strain and dopant activation in ion implanted strained Si nanowires

Minamisawa, R. A.FZJ* ; Habicht, S.FZJ* ; Buca, D.FZJ* ; Carius, R.FZJ* ; Trellenkamp, S.FZJ* ; Bourdelle, K. K. ; Mantl, S.FZJ*

2010
American Institute of Physics Melville, NY

Journal of applied physics 108, 124908 (2010) [10.1063/1.3520665]

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Please use a persistent id in citations: http://hdl.handle.net/2128/17213 doi:10.1063/1.3520665

Abstract: Strained Si nanowires (NWs) are attractive for deeply-scaled complementary metal-oxide-semiconductor devices due to the combination of enhanced carrier mobility and excellent electrostatic control as was demonstrated with trigate metal-oxide-semiconductor field effect transistors. The challenge in using strained Si NWs for devices is to preserve the elastic strain during the required processing steps. In this work we investigated the influence of fundamental processing steps like patterning and dopant ion implantation on the structural and transport properties of strained Si layers and NWs on silicon-on-insulator (SOI) substrates. NWs with widths down to 35 nm, fabricated on 25 nm strained SOI and implanted to doses ranging from 5 x 10(14) to 2 x 10(15) ions/cm(2) were investigated. We show that strain conservation and a low sheet resistivity of 6.2 x 10(-4) Omega cm, close to the layer resistivity, can only be obtained if the NWs are patterned on doped layers. For NWs directly implanted to doses above 1 x 10(15) ions/cm(2), complete strain relaxation and structural disorder by solid phase recrystallization were observed. In both cases, NWs with widths smaller than 55 nm exhibit an increased specific resistivity. (C) 2010 American Institute of Physics. [doi:10.1063/1.3520665]

Keyword(s): J

Classification:

Physics, Applied

Note: The authors would like to thank Mr. W. Michelsen for performing the ion implantations, Mrs. Steffi Lenk for the electron microscopy, and Mr. M. Hulsbeck for the Raman spectroscopy measurements. This work was partially supported by the German Federal Ministry of Education and Research via the MEDEA + project DECISIF (2T104) and by the European Community through Nanosil network of excellence (FP7 Grant No. 216171).

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Appears in the scientific report 2010
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OpenAccess