Chemical solution deposition of ferroelectric yttrium-doped hafnium oxide films on platinum electrodes

Starschich, S.; Böttger, U.; Schneller, T.; Griesche, D.; Waser, R.

doi:10.1063/1.4879283

Journal Article

FZJ-2015-00577

Chemical solution deposition of ferroelectric yttrium-doped hafnium oxide films on platinum electrodes

Starschich, S. (Corresponding Author) ; Griesche, D. ; Schneller, T. ; Waser, R.FZJ* ; Böttger, U.

2014
American Inst. of Physics Melville, NY

Applied physics letters 104(20), 202903 (2014) [10.1063/1.4879283]

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Please use a persistent id in citations: http://hdl.handle.net/2128/16834 doi:10.1063/1.4879283

Abstract: Ferroelectric hafnium oxide films were fabricated by chemical solution deposition with a remnant polarization of >13 μC/cm2. The samples were prepared with 5.2 mol. % yttrium-doping and the thickness varied from 18 nm to 70 nm. The hafnium oxide layer was integrated into a metal-insulator-metal capacitor using platinum electrodes. Due to the processing procedure, no thickness dependence of the ferroelectric properties was observed. To confirm the ferroelectric nature of the deposited samples, polarization, capacitance, and piezoelectric displacement measurements were performed. However, no evidence of the orthorhombic phase was found which has been proposed to be the non-centrosymmetric, ferroelectric phase in HfO2.

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