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| Hauptseite > Publikationsdatenbank > Growth of Ag on the Bi-terminated Ge/Si(111) surface |
| Hauptseite > Publikationsdatenbank > Growth of Ag on the Bi-terminated Ge/Si(111) surface |
| Journal Article | PreJuSER-312 |
;
2008
Elsevier
Amsterdam
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Please use a persistent id in citations: doi:10.1016/j.susc.2008.03.045
Abstract: The presence of a Bi layer during Ge epitaxy at the Si(1 11) surface suppresses Si-Ge intermixing and also allows us to distinguish between Si and Ge in scanning tunneling microscopy at the atomic level. In our investigation, we explored the possibility of a selective growth of Ag either on a Ge area or a Si area. We found that a chemically selective bonding of Ag to Si or Ge at the prestructured Ge/Si surface does not occur. Due to the strong passivation of Si and of the Ge surfaces by a layer of Bi at room and elevated temperatures Ag collects into 3D islands without being incorporated into the surface. Co-deposition of Ag during the epitaxy of Ge on the Bi-terminated Si(1 11) surface also leads to an accumulation of Ag into 3D islands, while the remaining surface is covered by a layer of Bi. (c) 2008 Elsevier B.V. All rights reserved.
Keyword(s): J ; scanning tunneling microscopy (auto) ; molecular beam epitaxy (auto) ; bismuth (auto) ; silver (auto) ; silicon (auto) ; germanium (auto) ; nucleation (auto) ; growth (auto)
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