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Resonant Tunneling Magnetoresistive in Antiferromagnetically coupled Fe-based Structures with Multilayered Si/Ge Spacers

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2006
American Institute of Physics Melville, NY

Applied physics letters 88, 172105 () [10.1063/1.2198812]

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Abstract: We report on the experimental evidence of the tunneling magnetoresistance (TMR) effect near 3% and its inversion in strongly antiferromagnetically coupled Fe(001)/([Si(0.2 nm)/Ge(0.2 nm)](*)5)/Fe epitaxial structures with diffused interfaces. We explain the inversion of TMR with biasing voltage by resonant tunneling across impurity states with weak spin split Delta E similar to 10 meV and spin-dependent filtering in the spacer layer. The resonant tunneling is manifested in spin-dependent resonances close to zero biasing voltages related to antiferromagnetic coupling across impurity states. (c) 2006 American Institute of Physics.

Keyword(s): J

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Note: Record converted from VDB: 12.11.2012

Contributing Institute(s):
  1. Elektronische Materialien (IFF-IEM)
  2. Center of Nanoelectronic Systems for Information Technology (CNI)
  3. Mikrostrukturforschung (IFF-IMF)
  4. Elektronische Eigenschaften (IFF-IEE)
Research Program(s):
  1. Grundlagen für zukünftige Informationstechnologien (P42)

Appears in the scientific report 2006
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 Record created 2012-11-13, last modified 2024-06-10


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