Journal Article

FZJ-2016-02791

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Fractional Talbot lithography with extreme ultraviolet light

Kim, H.-s. (Corresponding author)FZJ* ; Li, W. ; Danylyuk, S.RWTH* ; Brocklesby, W. S. ; Marconi, M. C. ; Juschkin, L. (Corresponding author)FZJ*RWTH*

2014
Soc. Washington, DC

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Please use a persistent id in citations: doi:10.1364/OL.39.006969

Abstract: Fractional Talbot effect leads to the possibility to implement patterning of structures with smaller periods than the master mask. This is particularly attractive when using short wavelength illumination in the extreme ultraviolet because of attainable resolution in the sub-100-nm range. In this Letter, we demonstrate the Talbot lithography with the fractional Talbot effect under coherent illumination generated with a capillary discharge Ne-like Ar extreme ultraviolet laser. Various spatial frequency multiplications up to 5𝑥 are achieved using a parent grating. This technique allows a fabrication of nanostructures with high-resolution patterns, which is of high interest in many applications such as the manufacturing of plasmonic surfaces and photonic devices.

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Contributing Institute(s):

1. Halbleiter-Nanoelektronik (PGI-9)
2. JARA-FIT (JARA-FIT)

Research Program(s):

1. 521 - Controlling Electron Charge-Based Phenomena (POF3-521) (POF3-521)

Appears in the scientific report 2016

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Database coverage:
; Current Contents - Engineering, Computing and Technology ; Current Contents - Physical, Chemical and Earth Sciences ; IF < 5 ; JCR ; SCOPUS ; Science Citation Index ; Science Citation Index Expanded ; Thomson Reuters Master Journal List ; Web of Science Core Collection

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