Journal Article FZJ-2017-06683

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Response to the comment by C. Kisielowsky, H.A. Calderon, F.R. Chen, S. Helveg, J.R. Jinschek, P. Specht, D. van Dyck on the article "On the influence of the electron dose-rate on the HRTEM Image contrast" by J. Barthel, M. Lentzen, A. Thust

 ;  ;

2017
Elsevier Science Amsterdam

Ultramicroscopy 179, 113 - 115 () [10.1016/j.ultramic.2017.04.004]

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Abstract: In a recent article [1] we examined the influence of the applied electron dose rate on the magnitude of the image contrast in high-resolution transmission electron microscopy (HRTEM). We concluded that the magnitude of the image contrast is not substantially affected by the applied electron dose rate. This result is in obvious contradiction to numerous earlier publications by Kisielowski and coworkers [2–7], who commented our recent article due to this contradiction. The present short communication is a response to the comment of Kisielowski and coworkers on our recent article, where we provide additional arguments supporting our initial findings and conclusions on the magnitude of the image contrast in HRTEM.

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Contributing Institute(s):
  1. Physik Nanoskaliger Systeme (ER-C-1)
  2. Materialwissenschaft u. Werkstofftechnik (ER-C-2)
Research Program(s):
  1. 143 - Controlling Configuration-Based Phenomena (POF3-143) (POF3-143)

Appears in the scientific report 2017
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Medline ; BIOSIS Previews ; Current Contents - Life Sciences ; Current Contents - Physical, Chemical and Earth Sciences ; Ebsco Academic Search ; IF < 5 ; JCR ; NCBI Molecular Biology Database ; NationallizenzNationallizenz ; SCOPUS ; Science Citation Index ; Science Citation Index Expanded ; Thomson Reuters Master Journal List ; Web of Science Core Collection
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 Record created 2017-09-21, last modified 2021-01-29


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