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Conference Presentation (Other) FZJ-2018-02345
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Hafnium oxide interface formation during ALD oxide growth on pure Hf films for resistive switches

 ;  ;  ;  ;  ;

2018

DPG Frühjahrstagung, BerlinBerlin, Germany, 11 Mar 2018 - 16 Mar 20182018-03-112018-03-16

Contributing Institute(s):
  1. Elektronische Materialien (PGI-7)
  2. JARA-FIT (JARA-FIT)
Research Program(s):
  1. 524 - Controlling Collective States (POF3-524) (POF3-524)

Appears in the scientific report 2018
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The record appears in these collections:
Document types > Presentations > Conference Presentations
JARA > JARA > JARA-JARA\-FIT
Institute Collections > PGI > PGI-7
Workflow collections > Public records
Publications database
 Record created 2018-04-12, last modified 2021-01-29
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