Journal Article FZJ-2021-01569

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Inelastic Scattering in Electron Backscatter Diffraction and Electron Channeling Contrast Imaging

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2020
Cambridge University Press New York, NY

Microscopy and microanalysis 26(6), 1147 - 1157 () [10.1017/S1431927620024605]

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Abstract: Electron backscatter diffraction (EBSD) and electron channeling contrast imaging (ECCI) are used to extract crystallographic information from bulk samples, such as their crystal structure and orientation as well as the presence of any dislocation and grain boundary defects. These techniques rely on the backscattered electron signal, which has a large distribution in electron energy. Here, the influence of plasmon excitations on EBSD patterns and ECCI dislocation images is uncovered by multislice simulations including inelastic scattering. It is shown that the Kikuchi band contrast in an EBSD pattern for silicon is maximum at small energy loss (i.e., few plasmon scattering events following backscattering), consistent with previous energy-filtered EBSD measurements. On the other hand, plasmon excitation has very little effect on the ECCI image of a dislocation. These results are explained by examining the role of the characteristic plasmon scattering angle on the intrinsic contrast mechanisms in EBSD and ECCI.

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Contributing Institute(s):
  1. Materialwissenschaft u. Werkstofftechnik (ER-C-2)
Research Program(s):
  1. 143 - Controlling Configuration-Based Phenomena (POF3-143) (POF3-143)

Appears in the scientific report 2021
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Medline ; Embargoed OpenAccess ; Allianz-Lizenz / DFG ; BIOSIS Previews ; Biological Abstracts ; Clarivate Analytics Master Journal List ; Current Contents - Life Sciences ; Current Contents - Physical, Chemical and Earth Sciences ; Essential Science Indicators ; IF < 5 ; JCR ; NationallizenzNationallizenz ; SCOPUS ; Science Citation Index Expanded ; Web of Science Core Collection
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 Record created 2021-03-30, last modified 2023-01-11


Published on 2020-11-16. Available in OpenAccess from 2021-05-16.:
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