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| Hauptseite > Publikationsdatenbank > Fabrication of gate electrodes for scalable quantum computing using CMOS industry compatible e-beam lithography and numerical simulation of the resulting quantum device |
| Hauptseite > Publikationsdatenbank > Fabrication of gate electrodes for scalable quantum computing using CMOS industry compatible e-beam lithography and numerical simulation of the resulting quantum device |
| Contribution to a conference proceedings/Contribution to a book | FZJ-2024-01807 |
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2023
SPIE
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Please use a persistent id in citations: doi:10.1117/12.2675943
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