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| Home > Publications database > Fabrication of Light-Scattering Multiscale Textures by Nanoimprinting for the Application to Thin-Film Silicon Solar Cells |
| Journal Article | FZJ-2014-05665 |
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2014
IEEE
New York, NY
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Please use a persistent id in citations: doi:10.1109/JPHOTOV.2014.2311233
Abstract: In this study, nanoimprint processing was used to realize various multiscale textures on glass substrates for application in thin-film photovoltaic devices. The multiscale textures are formed by a combination of large and small features, which proofed to be beneficial for light trapping in silicon thin-film solar cells. Two approaches for the fabrication of multiscale textures are presented in this study. In the first approach, the multiscale texture is realized at the lacquer/transparent conductive oxide (TCO) interface, and in the second approach, the multiscale texture is realized at the TCO/Si interface. Various types of multiscale textures were fabricated and tested in microcrystalline thin-film silicon solar cells in p-i-n configuration to identify the optimal texture for the light management. It was found that the best light-scattering multiscale texture was realized using an imprint-textured glass substrate, which contains large craters, in combination with HF-etched TCO (ZnO:Al), which contains small features, on top of the imprint. With this structure (of the second approach), the short-circuit current density of the solar cell devices was improved by 0.6 mA/cm2 using multiscale textures realized by nanoimprint processing.
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