Journal Article PreJuSER-19937

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Fabrication of layered nanostructures by successive electron beam induced deposition with two precursors: protective capping of metallic iron structures

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2011
IOP Publ. Bristol

Nanotechnology 22, 475304 () [10.1088/0957-4484/22/47/475304]

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Abstract: We report on the stepwise generation of layered nanostructures via electron beam induced deposition (EBID) using organometallic precursor molecules in ultra-high vacuum (UHV). In a first step a metallic iron line structure was produced using iron pentacarbonyl; in a second step this nanostructure was then locally capped with a 2-3 nm thin titanium oxide-containing film fabricated from titanium tetraisopropoxide. The chemical composition of the deposited layers was analyzed by spatially resolved Auger electron spectroscopy. With spatially resolved x-ray absorption spectroscopy at the Fe L₃ edge, it was demonstrated that the thin capping layer prevents the iron structure from oxidation upon exposure to air.

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Note: This work has been supported by the 'Deutsche Forschungsgemeinschaft' through Grant MA 4246/1-2, COST actions CM0601 and D41 and by the Cluster of Excellence 'Engineering of Advanced Materials' (EAM). AXG and CSF also gratefully acknowledge salary support from the US Department of Energy under Contract No. DE-AC02-05CH11231. CP and BB acknowledge financial support from the Humboldt Foundation. We thank Stefan Tampier (Inorganic Chemistry, University Erlangen-Nuremberg) for technical assistance.

Contributing Institute(s):
  1. Elektronische Eigenschaften (PGI-6)
Research Program(s):
  1. Grundlagen für zukünftige Informationstechnologien (P42)

Appears in the scientific report 2011
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 Record created 2012-11-13, last modified 2018-02-08



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