Journal Article PreJuSER-22690

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Electrical and structural characterization of AlGaN/GaN field-effect transistors with recessed gate

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2012
Elsevier Science Amsterdam [u.a.]

Vacuum 86(6), 754 - 756 () [10.1016/j.vacuum.2011.07.016]

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Abstract: Performance of AlGaN/GaN heterostructure field-effect transistors (HFETs) with recessed gate was investigated and compared with non-recessed counterparts. Optimal dry etch conditions by plasma assisted Ar sputtering were found for similar to 6 nm gate recess of a 20 nm thick AlGaN barrier layer. A decrease of the residual strain after the gate recessing (from -0.9 GPa to -0.68 GPa) was evaluated from the photoluminescence measurement. The saturation drain current at the gate voltage V-G = 1 V decreased from 1.05 A/mm to 0.85 A/mm after the recessing. The gate voltage for a maximal transconductance (240-250 mS/mm) has shifted from -3 V for non-recessed HFETs to -0.2 V for recessed counterparts. Similarly, the threshold voltage increased after the gate recessing. A decrease of the sheet charge density from 1 x 10(13) cm(-2) to 4 x 10(12) cm(-2) at V-G = 0 V has been evaluated from the capacitance measurements. The RF measurements yielded a slight increase of the cut-off frequencies after the gate recessing. All these indicate that the gate recessing is a useful tool to optimize the AlGaN/GaN HFET performance for high-frequency applications as well as for the preparation of normally-off devices. (C) 2011 Elsevier Ltd. All rights reserved.

Keyword(s): J ; Gallium nitride (auto) ; Plasma assisted etching (auto) ; Electrical properties (auto) ; Photoluminescence (auto) ; Transistor (auto)


Note: The work reported here was supported by the Slovak Scientific Grant Agency VEGA (Contract Nos. 1/0866/11 and 2/0098/09) and the Centre of Excellence CENAMOST (VVCE-0049-07).

Contributing Institute(s):
  1. Halbleiter-Nanoelektronik (PGI-9)
  2. Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology (JARA-FIT)
Research Program(s):
  1. Grundlagen für zukünftige Informationstechnologien (P42)

Appears in the scientific report 2012
Database coverage:
Medline ; BIOSIS Previews ; Current Contents - Physical, Chemical and Earth Sciences ; JCR ; NationallizenzNationallizenz ; SCOPUS ; Science Citation Index ; Science Citation Index Expanded ; Thomson Reuters Master Journal List ; Web of Science Core Collection
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 Record created 2012-11-13, last modified 2020-06-04



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