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Optical and structural properties of ß-FeSi2 precipitate layers in silicon

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2003
American Institute of Physics Melville, NY

Journal of applied physics 94, 207 - 211 () [10.1063/1.1576902]

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Abstract: Semiconducting iron disilicide (beta-FeSi2) precipitates in silicon were fabricated by ion beam synthesis. The samples were characterized by Raman spectroscopy, transmission electron microscopy, and photoluminescence spectroscopy. By comparison with a beta-FeSi2 single crystal, the silicide precipitates are found to be unstrained in all cases, so there is no correlation between strain and photoluminescence efficiency. Our results indicate that carrier recombination at silicon dislocations is sufficient to explain the photoluminescence in our samples. (C) 2003 American Institute of Physics.

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Note: Record converted from VDB: 12.11.2012

Contributing Institute(s):
  1. Institut für Halbleiterschichten und Bauelemente (ISG-1)
  2. Institut für Photovoltaik (IPV)
Research Program(s):
  1. Materialien, Prozesse und Bauelemente für die Mikro- und Nanoelektronik (I01)
  2. Photovoltaik (E02)

Appears in the scientific report 2003
Notes: This version is available at the following Publisher URL: http://jap.aip.org
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 Record created 2012-11-13, last modified 2024-07-12


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