Journal Article

PreJuSER-47376

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Steady-state surface stress induced in nobel gas sputtering

Dahmen, K.FZJ* ; Giesen, M.FZJ* ; Ikonomov, K.FZJ* ; Ibach, H.FZJ* ; Starbova, K.FZJ*

2003
Elsevier Amsterdam [u.a.]

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Please use a persistent id in citations: doi:10.1016/S0040-6090(02)01182-3

Abstract: We have measured the surface stress on single crystal Cu(100) surfaces as induced by bombardment of the surface with the noble gas ions Ar, Ne and He at room temperature. Regardless of the ion type and energy, the induced stress is compressive and saturates as a function of sputter time at a value between 2 and 15 N/m. Saturation time and magnitude of the induced stress depend on the ion species and their energy. The time dependence can be accounted for by assuming a steady state thickness of a defective surface layer, which arises from a balance between sputtering and ion implantation. (C) 2002 Elsevier Science B.V. All rights reserved.

Keyword(s): J ; atom solid interaction (auto) ; sputtering (auto) ; surface stress (auto) ; radiation damage (auto) ; copper (auto) ; single crystal surfaces (auto)

Note: Record converted from VDB: 12.11.2012

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Contributing Institute(s):

1. Institut für Grenzflächen und Vakuumtechnologien (ISG-3)
2. Institut für biologisch-anorganische Grenzflächen (ISG-4)

Research Program(s):

1. Kondensierte Materie (M02)

Appears in the scientific report 2003

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