Journal Article

FZJ-2017-06018

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png About the influence of deposited nitride layers on oxide precipitation after RTA pre-treatment

Kissinger, G. ; Kot, D. ; Dabrowski, J. ; Grabolla, T. ; Müller, T. ; Sattler, A.

2017
Wiley-VCH Weinheim

This record in other databases:  

Please use a persistent id in citations: doi:10.1002/pssa.201700236

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Research Program(s):

1. 899 - ohne Topic (POF3-899) (POF3-899)
2. Modelling of Nucleation and Growth Processes for Silicon-Compatible Microelectronics (hfo06_20101101) (hfo06_20101101)

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Database coverage:
; Current Contents - Physical, Chemical and Earth Sciences ; IF < 5 ; JCR ; Nationallizenz ; SCOPUS ; Science Citation Index ; Science Citation Index Expanded ; Thomson Reuters Master Journal List ; Web of Science Core Collection

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