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Poster (Other) FZJ-2017-06526
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Comparison of plasma-enhanced and thermal atomic layer deposited TiO2 for the integration into HfO2/TiO2-based resistive switching devices

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2017

European Materials Research Meeting, EMRS, WarsawWarsaw, Poland, 18 Sep 2017 - 22 Sep 20172017-09-182017-09-22

Contributing Institute(s):
  1. Elektronische Materialien (PGI-7)
  2. JARA Institut Green IT (PGI-10)
  3. JARA-FIT (JARA-FIT)
Research Program(s):
  1. 524 - Controlling Collective States (POF3-524) (POF3-524)

Appears in the scientific report 2017
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The record appears in these collections:
JARA > JARA > JARA-JARA\-FIT
Document types > Presentations > Poster
Institute Collections > PGI > PGI-10
Institute Collections > PGI > PGI-7
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 Record created 2017-09-13, last modified 2021-01-29
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