Journal Article

FZJ-2019-00597

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Temperature and hydrogen diffusion length in hydrogenated amorphous silicon films on glass while scanning with a continuous wave laser at 532 nm wavelength

Beyer, W. (Corresponding author)FZJ* ; Andrä, G. ; Bergmann, J. ; Breuer, U.FZJ* ; Finger, F.FZJ* ; Gawlik, A. ; Haas, S.FZJ* ; Lambertz, A.FZJ* ; Maier, F. C. ; Nickel, N. H. ; Zastrow, U.FZJ*

2018
American Inst. of Physics Melville, NY

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Please use a persistent id in citations: http://hdl.handle.net/2128/21356  doi:10.1063/1.5038090

Abstract: Rapid thermal annealing by, e.g., laser scanning of hydrogenated amorphous silicon (a-Si:H) films is of interest for device improvement and for development of new device structures for solar cell and large area display application. For well controlled annealing of such multilayers, precise knowledge of temperature and/or hydrogen diffusion length in the heated material is required but unavailable so far. In this study, we explore the use of deuterium (D) and hydrogen (H) interdiffusion during laser scanning (employing a continuous wave laser at 532 nm wavelength) to characterize both quantities. The evaluation of temperature from hydrogen diffusion data requires knowledge of the high temperature (T > 500 °C) deuterium-hydrogen (D-H) interdiffusion Arrhenius parameters for which, however, no experimental data exist. Using data based on recent model considerations, we find for laser scanning of single films on glass substrates a broad scale agreement with experimental temperature data obtained by measuring the silicon melting point and with calculated data using a physical model as well as published work. Since D-H interdiffusion measures hydrogen diffusion length and temperature within the silicon films by a memory effect, the method is capable of determining both quantities precisely also in multilayer structures, as is demonstrated for films underneath metal contacts. Several applications are discussed. Employing literature data of laser-induced temperature rise, laser scanning is used to measure the H diffusion coefficient at T > 500 °C in a-Si:H. The model-based high temperature hydrogen diffusion parameters are confirmed with important implications for the understanding of hydrogen diffusion in the amorphous silicon material

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Contributing Institute(s):

1. Photovoltaik (IEK-5)
2. Analytik (ZEA-3)

Research Program(s):

1. 121 - Solar cells of the next generation (POF3-121) (POF3-121)

Appears in the scientific report 2018

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Database coverage:
; ; Clarivate Analytics Master Journal List ; Current Contents - Physical, Chemical and Earth Sciences ; Ebsco Academic Search ; IF < 5 ; JCR ; National-Konsortium ; Nationallizenz ; PubMed Central ; SCOPUS ; Science Citation Index ; Science Citation Index Expanded ; Web of Science Core Collection

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