Journal Article

FZJ-2019-05269

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Selective area growth and stencil lithography for in situ fabricated quantum devices

Schüffelgen, P. (Corresponding author)FZJ* ; Rosenbach, D.FZJ* ; Li, C. ; Schmitt, T. W.FZJ* ; Schleenvoigt, M.FZJ* ; Jalil, A. R.FZJ* ; Schmitt, S.FZJ* ; Kölzer, J.FZJ* ; Wang, M. ; Bennemann, B.FZJ* ; Parlak, U.FZJ* ; Kibkalo, L.FZJ* ; Trellenkamp, S.FZJ* ; Grap, T.FZJ* ; Meertens, D.FZJ* ; Luysberg, M.FZJ* ; Mussler, G.FZJ* ; Berenschot, E. ; Tas, N. ; Golubov, A. A. ; Brinkman, A. ; Schäpers, T.FZJ* ; Grützmacher, D.FZJ*

2019
Nature Publishing Group London [u.a.]

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Please use a persistent id in citations: http://hdl.handle.net/2128/23180  doi:10.1038/s41565-019-0506-y

Abstract: The interplay of Dirac physics and induced superconductivity at the interface of a 3D topological insulator (TI) with an s-wave superconductor (S) provides a new platform for topologically protected quantum computation based on elusive Majorana modes. To employ such S–TI hybrid devices in future topological quantum computation architectures, a process is required that allows for device fabrication under ultrahigh vacuum conditions. Here, we report on the selective area growth of (Bi,Sb)2Te3 TI thin films and stencil lithography of superconductive Nb for a full in situ fabrication of S–TI hybrid devices via molecular-beam epitaxy. A dielectric capping layer was deposited as a final step to protect the delicate surfaces of the S–TI hybrids at ambient conditions. Transport experiments in as-prepared Josephson junctions show highly transparent S–TI interfaces and a missing first Shapiro step, which indicates the presence of Majorana bound states. To move from single junctions towards complex circuitry for future topological quantum computation architectures, we monolithically integrated two aligned hardmasks to the substrate prior to growth. The presented process provides new possibilities to deliberately combine delicate quantum materials in situ at the nanoscale.

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Contributing Institute(s):

1. Halbleiter-Nanoelektronik (PGI-9)
2. JARA-FIT (JARA-FIT)
3. Helmholtz - Nanofacility (HNF)
4. JARA Institut Green IT (PGI-10)
5. Physik Nanoskaliger Systeme (ER-C-1)

Research Program(s):

1. 522 - Controlling Spin-Based Phenomena (POF3-522) (POF3-522)

Appears in the scientific report 2019

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Database coverage:
; ; Clarivate Analytics Master Journal List ; Current Contents - Engineering, Computing and Technology ; Current Contents - Physical, Chemical and Earth Sciences ; Ebsco Academic Search ; IF >= 30 ; JCR ; NCBI Molecular Biology Database ; Nationallizenz ; SCOPUS ; Science Citation Index ; Science Citation Index Expanded ; Web of Science Core Collection

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