Journal Article

FZJ-2020-01022

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Towards Oxide Electronics: a Roadmap

Coll, M. ; Fontcuberta, J. ; Althammer, M. ; Bibes, M. ; Boschker, H. ; Calleja, A. ; Cheng, G.FZJ* ; Cuoco, M. ; Dittmann, R.FZJ* ; Dkhil, B. ; El Baggari, I. ; Fanciulli, M. ; Fina, I. ; Fortunato, E. ; Frontera, C. ; Fujita, S. ; Garcia, V. ; Goennenwein, S. T. B. ; Granqvist, C.-G. ; Grollier, J. ; Gross, R. ; Hagfeldt, A. ; Herranz, G. ; Hono, K. ; Houwman, E. ; Huijben, M. ; Kalaboukhov, A. ; Keeble, D. J. ; Koster, G. ; Kourkoutis, L. F. ; Levy, J. ; Lira-Cantu, M. ; MacManus-Driscoll, J. L. ; Mannhart, J. ; Martins, R. ; Menzel, S. ; Mikolajick, T. ; Napari, M. ; Nguyen, M. D. ; Niklasson, G. ; Paillard, C. ; Panigrahi, S. ; Rijnders, G. ; Sánchez, F. ; Sanchis, P. ; Sanna, S. ; Schlom, D. G. ; Schroeder, U.FZJ* ; Shen, K. M. ; Siemon, A. ; Spreitzer, M. ; Sukegawa, H. ; Tamayo, R. ; van den Brink, J. ; Pryds, N. ; Granozio, F. M. (Corresponding author)

2019
Elsevier Amsterdam

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Please use a persistent id in citations: http://hdl.handle.net/2128/24328  doi:10.1016/j.apsusc.2019.03.312

Abstract: At the end of a rush lasting over half a century, in which CMOS technology has been experiencing a constant and breathtaking increase of device speed and density, Moore’s law is approaching the insurmountable barrier given by the ultimate atomic nature of matter. A major challenge for 21st century scientists is finding novel strategies, concepts and materials for replacing silicon-based CMOS semiconductor technologies and guaranteeing a continued and steady technological progress in next decades. Among the materials classes candidate to contribute to this momentous challenge, oxide films and heterostructures are a particularly appealing hunting ground. The vastity, intended in pure chemical terms, of this class of compounds, the complexity of their correlated behaviour, and the wealth of functional properties they display, has already made these systems the subject of choice, worldwide, of a strongly networked, dynamic and interdisciplinary research community.

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Contributing Institute(s):

1. Elektronische Materialien (PGI-7)
2. JARA-FIT (JARA-FIT)
3. Werkstoffstruktur und -eigenschaften (IEK-2)
4. Theoretische Nanoelektronik (PGI-2)

Research Program(s):

1. 521 - Controlling Electron Charge-Based Phenomena (POF3-521) (POF3-521)

Appears in the scientific report 2019

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Database coverage:
; ; ; Clarivate Analytics Master Journal List ; Current Contents - Engineering, Computing and Technology ; Current Contents - Physical, Chemical and Earth Sciences ; Ebsco Academic Search ; IF < 5 ; JCR ; Nationallizenz ; SCOPUS ; Science Citation Index ; Science Citation Index Expanded ; Web of Science Core Collection

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