Contribution to a book

FZJ-2020-03658

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Admittance Spectroscopy of Si/LaLuO3 and Si/GdSiO MOS Structures

Ducroquet, F. ; Engström, O. ; Gottlob, H. D. B. ; Lopes, J. M. J. ; Schubert, J.FZJ*

2012
Electrochemical Society (ECS) Pennington, NJ

This record in other databases:  

Please use a persistent id in citations: doi:10.1149/1.3700877

Note: Record converted from VDB: 12.11.2012

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Contributing Institute(s):

1. Halbleiter-Nanoelektronik (PGI-9)
2. Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology (JARA-FIT)

Research Program(s):

1. Grundlagen für zukünftige Informationstechnologien (P42)

Appears in the scientific report 2012

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