Journal Article

FZJ-2021-05344

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Link between plasma properties with morphological, structural and mechanical properties of thin Ti films deposited by high power impulse magnetron sputtering

Moskovkin, P. ; Maszl, C. ; Schierholz, R.FZJ* ; Breilmann, W. ; Petersen, J. ; Pflug, A. ; Muller, J. ; Raza, M. ; Konstantinidis, S. ; von Keudell, A. ; Lucas, S. (Corresponding author)

2021
Elsevier Science Amsterdam [u.a.]

This record in other databases:    

Please use a persistent id in citations: doi:10.1016/j.surfcoat.2021.127235

Note: Kein Post-print vorhanden

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Contributing Institute(s):

1. Grundlagen der Elektrochemie (IEK-9)

Research Program(s):

1. 1223 - Batteries in Application (POF4-122) (POF4-122)

Appears in the scientific report 2021

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Database coverage:
; Clarivate Analytics Master Journal List ; Current Contents - Engineering, Computing and Technology ; Ebsco Academic Search ; Essential Science Indicators ; IF < 5 ; JCR ; Nationallizenz ; SCOPUS ; Science Citation Index Expanded ; Web of Science Core Collection

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