Home > Publications database > Prevention of Bunched Basal Plane Dislocation Arrays in 4H-SiC PVT-Growth |
Journal Article | FZJ-2023-02242 |
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2023
Trans Tech Publications Ltd.
Baech
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Please use a persistent id in citations: http://hdl.handle.net/2128/34497 doi:10.4028/p-eu98j0
Abstract: To prevent arrays of basal plane dislocations (BPD) forming during grown 4H-SiC single crystals, the growth cell in physical vapor transport (PVT) growth was modified by adapting the temperature gradients, the seed attachment method and the seeding phase. The resulting reduction in stress was modeled numerically and the crystals were investigated by X-ray topography (XRT) and molten potassium hydroxide (KOH) etching. Due to these modifications, the formation of BPD arrays was completely suppressed.
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