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Dünnschichten aus Silizium hergestellt durch CVD mittels Flüssigsilanen mit einstellbarem Kohlenstoffgehalt

 ;  ;

2025

Patent No.: DE102023118799A1; DE 102023118799

Contributing Institute(s):
  1. Photovoltaik (IMD-3)
Research Program(s):
  1. 1211 - Wind Energy Technology (POF4-121) (POF4-121)
  2. 5215 - Towards Quantum and Neuromorphic Computing Functionalities (POF4-521) (POF4-521)

Appears in the scientific report 2025
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The record appears in these collections:
Institute Collections > IMD > IMD-3
Document types > Patents > Patents
Workflow collections > Public records
Publications database
 Record created 2025-07-15, last modified 2025-07-17
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