Home > Publications database > Chemical Etching of Zinc Oxide for Thin-Film Silicon Solar Cells |
Journal Article | PreJuSER-19931 |
; ; ;
2012
Wiley-VCH Verl.
Weinheim
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Please use a persistent id in citations: http://hdl.handle.net/2128/4524 doi:10.1002/cphc.201100738
Abstract: Chemical etching is widely applied to texture the surface of sputter-deposited zinc oxide for light scattering in thin-film silicon solar cells. Based on experimental findings from the literature and our own results we propose a model that explains the etching behavior of ZnO depending on the structural material properties and etching agent. All grain boundaries are prone to be etched to a certain threshold, that is defined by the deposition conditions and etching solution. Additionally, several approaches to modify the etching behavior through special preparation and etching steps are provided.
Keyword(s): J ; electrochemistry (auto) ; etching (auto) ; interfaces (auto) ; solar cells (auto) ; zinc oxide (auto)
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