Journal Article PreJuSER-6194

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Investigation of the reliability behavior of conductive-bridging memory cells

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2009
IEEE New York, NY

IEEE Electron Device Letters 30, 876 - 878 () [10.1109/LED.2009.2024623]

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Abstract: Conductive-bridging memory can store information as different resistance states even when not powered. In order to check reliability challenges for nonvolatile-memory applications, the data retention has to be tested carefully. This letter describes a new test scheme using electrical bias for acceleration and enables the fast recording of such detailed information. Experimental data for memory devices based on Ag:GeS2 as the active-matrix material are presented. Excellent stability and reproducibility of the resistance states for more than 300 cycles are demonstrated in the temperature range from 25 degrees C to 85 degrees C. Based on the calculated activation energy, ten years of data retention is extrapolated.

Keyword(s): J ; CBRAM (auto) ; chalcogenide (auto) ; nonvolatile memory (auto) ; reliability (auto) ; retention (auto)


Note: Record converted from VDB: 12.11.2012

Contributing Institute(s):
  1. Elektronische Materialien (IFF-6)
  2. Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology (JARA-FIT)
Research Program(s):
  1. Grundlagen für zukünftige Informationstechnologien (P42)

Appears in the scientific report 2009
Database coverage:
JCR ; Science Citation Index Expanded ; Thomson Reuters Master Journal List ; Web of Science Core Collection
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JARA > JARA > JARA-JARA\-FIT
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 Record created 2012-11-13, last modified 2018-02-08



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