Journal Article

FZJ-2019-02846

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Optical and structural characterization of orthorhombic LaLuO3 using extreme ultraviolet reflectometry

Tryus, M. (Corresponding author) ; Nikolaev, K. V. ; Makhotkin, I. A. ; Schubert, J.FZJ* ; Kibkalo, L.FZJ* ; Danylyuk, S. ; Giglia, A. ; Nicolosi, P. ; Juschkin, L.FZJ*

2019
Elsevier Amsterdam [u.a.]

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Please use a persistent id in citations: doi:10.1016/j.tsf.2019.04.037

Abstract: A thin orthorhombic LaLuO film, grown on SrTiO substrate by pulsed laser deposition, is characterized using multi-angle spectralextreme ultraviolet reflectometry (EUVR). Layer structure parameters and optical constants of LaLuO are determined simultaneously byfitting angular reflectivity curves in a wide spectral range (70–200 eV). From near-edge optical constant analysis, La:Lu stoichiometryratio and the film density are derived. Sample structure is additionally analyzed using XRR, AFM and TEM methods. EUVR as a methodof structural characterization is discussed in comparison with XRR. Correlation error analysis of the layer structure parameters,obtained from independent EUVR and XRR fits, is presented.

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Contributing Institute(s):

1. Halbleiter-Nanoelektronik (PGI-9)
2. JARA-FIT (JARA-FIT)

Research Program(s):

1. 521 - Controlling Electron Charge-Based Phenomena (POF3-521) (POF3-521)

Appears in the scientific report 2019

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Database coverage:
; Clarivate Analytics Master Journal List ; Current Contents - Engineering, Computing and Technology ; Current Contents - Physical, Chemical and Earth Sciences ; Ebsco Academic Search ; IF < 5 ; JCR ; Nationallizenz ; SCOPUS ; Science Citation Index ; Science Citation Index Expanded ; Web of Science Core Collection

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