Journal Article

FZJ-2020-01780

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Control of effective cooling rate upon magnetron sputter deposition ofglassy Ge 15 Te 85

Pries, J. ; Wei, S. ; Hoff, F. ; Lucas, P. (Corresponding author) ; Wuttig, M.FZJ*

2020
Elsevier Science Amsterdam [u.a.]

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Please use a persistent id in citations: http://hdl.handle.net/2128/24696  doi:10.1016/j.scriptamat.2019.11.024

Abstract: Reducing the enthalpy of as-deposited amorphous films is desirable as it improves their kinetic stability and enhances the reliability of resulting devices. Here we demonstrate that Ge15Te85 glass films of lower enthalpy are produced by increasing the voltage during magnetron sputter deposition. An increase of ~100 V leads to a drop in effective cooling rate of almost three orders of magnitude, thereby yielding markedly lower enthalpy glasses. The sputtering voltage therefore constitutes a novel parameter for tuning the fictive temperature of glass films, which could help to obtain ultra-stable glasses in combination with substrate temperature control.

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Contributing Institute(s):

1. JARA Institut Green IT (PGI-10)

Research Program(s):

1. 521 - Controlling Electron Charge-Based Phenomena (POF3-521) (POF3-521)

Appears in the scientific report 2020

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Database coverage:
; ; ; Clarivate Analytics Master Journal List ; Current Contents - Engineering, Computing and Technology ; Current Contents - Physical, Chemical and Earth Sciences ; Ebsco Academic Search ; IF < 5 ; JCR ; SCOPUS ; Science Citation Index ; Science Citation Index Expanded ; Web of Science Core Collection

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