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| Home > Publications database > Preferential sputtering induced Cr-Diffusion during plasma exposure of WCrY smart alloys |
| Home > Publications database > Preferential sputtering induced Cr-Diffusion during plasma exposure of WCrY smart alloys |
| Journal Article | FZJ-2021-01492 |
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2019
Elsevier Science
Amsterdam [u.a.]
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Please use a persistent id in citations: doi:10.1016/j.jnucmat.2019.151767
Abstract: WCrY Smart Alloys are developed as first wall material of future fusion devices such as DEMO. They aim at behaving like pure W during plasma operation due to depletion of the alloying elements Cr and Y. The Cr concentration gradients induced by preferential plasma sputtering cause Cr-diffusion. The exposure of WCrY and W samples to pure D plasma, with a plasma ion energy of , is simulated using the dynamic version of SDTrimSP. Cr-diffusion is included into the model. Simulation results are compared with experimental results. At sample temperatures of more than 600∘C and sputtering by D plus residual oxygen in the plasma ion flux, the Cr-transport to the surface leads to enhanced erosion for WCrY samples. A diffusion coefficient for Cr in WCrY of the order of is determined. The suitability of WCrY as first wall armour and the influence of further effects, considering especially Cr-diffusion, is discussed.
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